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Scanner

Device for illuminating wafers coated with photoresist material. Unlike steppers, scanners scan the entire mask with a beam of light.

Stepper

Device for illuminating wafers coated with photoresist material. Unlike scanners, steppers illuminate part of the wafer in one step, then move the wafer and/or the photomask and repeat the procedure.

Substrate

Plane-parallel plates of glass with a highly polished surface. These serve as raw material for making mask blanks. They are coated with a chromium and then a photoresist layer.

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Contact

Hellma Materials GmbH
Moritz-von-Rohr-Straße 1
07745 Jena
Germany

Phone +49 3641 2877-0
Fax +49 3641 2877-200
info.materials@hellma.com